The research team proposed a method called aberration-converged annular lithography (ACAL) system, as schematic diagram shown in Figure 1. The Gaussian beam is converted into a collimated annular beam ...

Researchers from the Paul Scherrer Institute, Laboratory of X-ray Nanoscience and Technologies, developed a method for producing denser circuit patterns. Modern microchips feature conductive tracks ...

Extreme ultraviolet lithography (EUVL) has emerged as a cornerstone technology in the semiconductor industry, enabling the production of devices with sub-10 nm feature sizes. By utilising a 13.5 nm ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...